Celebrating 25 Years of History with Nissan Technical Center R&D

August 27th, 2013 by

In 1988, Nissan celebrated a ground-breaking ceremony for its Research and Development Institute known appropriately as Nissan Research and Development which later grew to become the Nissan Technical Center of North America (NTCNA).Now, twenty five years later, Nissan is commemorating the twenty-fifth anniversary of their North American Technical Center in Farmington Hills, Michigan. (although it was technically moved, from Plymouth, Michigan, in 1991).Presently, the Farmington Hills facility is the primary place for Nissan R & D work and it houses some very important groups such as: production engineering, research and testing, buying and quality administration. In addition, the center helps stimulate the economy within the Michigan area, employing over 1,200 people.”Our dedicated workforce in the United States remains committed to engineering high-quality vehicles for our ever- increasing consumer base,” says Carla Bailo, Senior Vice President of Research & Development for Nissan Americas. “With that sentiment in mind, we are excited to add more engineers to our NTCNA family this year in a continued attempt to engineer vehicles that meet the expectations of Nissan owners.”1So how does Nissan decide to celebrate 25 years?A BBQ, only for employees, with games, great food and lots of Nissan items displayed. The big event was a thank you from Nissan for all those great employees from the Technical Center. Farmington Hills mayor, Barry Bricker, even made an appearance and speech.We at Ron Sayer Nissan appreciate all the work of the Nissan North American Technical Center because without it, the new Nissan lineup would not be what it is, today. To see for yourself what we’re talking about, we invite you to visit our convenient location of 1175 N. Woodruff Ave in Idaho Falls, ID, anytime you’d like!

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Source: 1 https://nissannews.com/en-US/nissan/usa/releases/nissan-technical-center-r-d-celebrates-25th-anniversary-and-continued-growth

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